Figure 1

(a) Scanning electron microscopy (SEM) image of the \(\Omega\)-shaped Cu/Au microresonator loop and the 5 \(\upmu\)m \(\times\) 1 \(\upmu\)m \(\times\) 50 nm Py strip sample positioned in the center. During the \(\upmu\)FMR measurements, the static external magnetic field H is applied in-plane of the microstrip at angle \(\phi _H\) with respect to the short axis of the strip. (b–e) SEM images of the (b) as-prepared Py microstrip, (c) edge-trimmed using Ne-FIB, (d) cut along by Ne-FIB leaving a nominal gap of 50 nm and (e) 100 nm. (f, g) Atomic force microscopy (AFM) profiles of the cut strips measured along the red arrows shown in (d) and (e), respectively. Dashed lines indicates the substrate level.