Figure 1
From: Flexible dispersion engineering using polymer patterning in nanophotonic waveguides

(a) The SEM image of the fabricated Si3N4 waveguides with a cross-section 500 nm × 3 μm. (b) The fabrication process of the polymer-cladding layer.
From: Flexible dispersion engineering using polymer patterning in nanophotonic waveguides
(a) The SEM image of the fabricated Si3N4 waveguides with a cross-section 500 nm × 3 μm. (b) The fabrication process of the polymer-cladding layer.