Figure 2
From: Strip-loaded Mach–Zehnder interferometer for absolute refractive index sensing
Fabrication process flow. Step1: ALD coating of the substrate with a 200 nm TiO\(_2\). Step 2: spin coating of the nLOF resist. Step 3: electron beam lithography. Step 4: development of nLOF, cleaning of the wafer, and cleaving of the chips prior to characterization.
