Table 2 Formation energy (Eform/eV atom−1), substitutional energy (Esubst/eV atom), substitutional energy with vacancy defects (Esubst-V/eV atom−1), resulting lattice constant (a), lattice parameters (a, b, and c), volume (V), and relative volume expansion (ΔV) of the random and Janus-type MoS2−xSex phases at different concentrations of Se. Negative values of Eform, Eseg, and Eseg-V designate a thermodynamically favorable process.

From: One-step sputtering of MoSSe metastable phase as thin film and predicted thermodynamic stability by computational methods

Se at. %

Eform/eV atom−1

Esubst/eV atom−1

Esusbt-V/eV atom−1

a/nm

a/nm

b/nm

c/nm

V/nm3

ΔV

Random MoS2−xSex

 0.0

0.3167

1.2668

1.2668

1.2668

1.7345

0.0%

 4

− 7.515

0.036

0.332

0.3174

1.270

1.270

1.254

1.750

0.92%

 8

− 7.479

0.072

0.663

0.3182

1.273

1.273

1.259

1.766

1.81%

 16

− 7.407

0.144

1.326

0.3196

1.279

1.279

1.270

1.797

3.49%

 33.3

− 7.263

0.288

2.651

0.3227

1.291

1.291

1.285

1.855

6.49%

Janus MoS2−xSex

 4

8.572

16.123

16.419

3.1875

1.275

1.275

1.248

1.756

0.47%

 8

8.608

16.159

16.750

3.1948

1.278

1.278

1.253

1.770

1.78%

 16

− 7.406

0.145

1.327

3.1968

1.279

1.279

1.266

1.792

3.33%

 33.3

− 7.259

0.292

2.656

0.3229

1.292

1.292

1.275

1.842

5.84%