Figure 5
From: Detecting defects that reduce breakdown voltage using machine learning and optical profilometry
The experimental vs ML model yield for all seven wafers in this study is show for pass/fail cutoff of 50 V (a), 600 V (b), and 950 V (c) representing 0th, 1st, and 2nd order defect detection. The RMS error for all four models at all cutoffs is shown in Table 2.
