Figure 3
From: On the reproducibility of electron-beam lithographic fabrication of photonic nanostructures
Resist thickness effect (a) Four gratings on the same chip for which the beam was focused at different positions. For the two sensors ‘TL and BL’, the beam was focused very close to the respective pattern area (position A). For the sensor TR, the beam was focused near the edge of the wafer which is the farthest point (Point C) from the pattern area. For the sensor BR, the beam is focused midway (Point B) between the pattern and the edge of the wafer, (b) The resonance positions for ‘TL and BL’ are the same within error, while the positions for TR and BR have shifted significantly.
