Figure 4
From: On the reproducibility of electron-beam lithographic fabrication of photonic nanostructures
SEM images of grating at (a) top left (TL) and (b) top right (TR). For an identical period of 436Â nm, the grating ridges are approximately 10Â nm wider for the TL case, explaining the change in resonance position. Please note that the measurement accuracy is of order of a few nm, as is typical for SEM micrograph analysis.
