Figure 2

Schematic diagram for the fabrication process of Ag NW-based electrodes on a COC film. (a) Spin-coating of positive photoresist layer; (b) heating the COC film at 100 °C for 2 min; (c) patterning the photoresist layer via photolithography; (d) developing the photoresist; (e) patterned COC film UVO treatment; (f) spin-coating Ag NWs; (g) heating at 110 °C for 30 min; (h) stripping the photoresist with ethanol and drying with N₂ gas.