Figure 3

(a) XRD around the (002) peak of the STO membrane transferred to an \(\hbox {Al}_2\) \(\hbox {O}_3\) host substrate as-transferred, subsequent to \(\hbox {TiO}_2\)-termination by HF etching, and after final annealing (from top to bottom, shown spectra are offset along the y-axis for clarity). The dotted line marks the theoretical position of the thin film peak. AFM scans of the STO membrane (b) as-transferred, (c) after BHF treatment, and d) after final annealing (white bars scale with \(1~\upmu\)m). Red symbols show the orientation of the line profiles taken over \(800~\text {nm}\) (shown as insets).