Correction to: npj 2D Materials and Applications https://doi.org/10.1038/s41699-021-00229-w, published online 22 April 2021
The original version of this Article contained an error in the Acknowledgements: ‘2021R1A2B5B0200216’ should have read ‘2021R1A2B5B02002167’. This has now been corrected in both the PDF and HTML versions of the Article.
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Cho, H.W., Pujar, P., Choi, M. et al. Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors. npj 2D Mater Appl 5, 58 (2021). https://doi.org/10.1038/s41699-021-00240-1
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DOI: https://doi.org/10.1038/s41699-021-00240-1
