Table 1 In situ characterization techniques for investigating the switching mechanism in memristors

From: Solution-processable 2D materials for monolithic 3D memory-sensing-computing platforms: opportunities and challenges

Characterisation technique

Information

Spatial resolution

Temporal resolution

Diffraction-limited confocal microscopy174

Visual inspection of features in the channel including filaments and dendrites

50 μm–100 μm

hours

In-situ C-AFM33,38

IV measurement, location of conductive filament, filament morphology and topography

10 nm–10 μm

100 ms-days

In-situ K-PFM33

Vacancy dynamics, quantification of vacancies, trapping/de-trapping of space charge and surface potential

10 nm–10 μm

100 ms-days

In-situ Photoluminescence Spectroscopy174

Localized oxidation of filament during switching

1 μm–10 μm

100 ms-hours

In-situ Thermal Imaging174

Spatial mapping of local temperature

5 μm–10 μm

hours

  1. Benchmarking is limited to reported solution-processed memristors only