Composite metal contacts deposited under high-vacuum conditions can be used to create molybdenum disulfide field-effect transistors with low contact resistance and a contacted poly pitch of just 60 nm.
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Chen, X., Han, ST. & Zhou, Y. Scaling the contacted poly pitch of 2D transistors. Nat Electron 8, 378–379 (2025). https://doi.org/10.1038/s41928-025-01383-5
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DOI: https://doi.org/10.1038/s41928-025-01383-5
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