Fig. 5: Reliability studies of SLCFET at the latching condition along with its practical application. | Nature Electronics

Fig. 5: Reliability studies of SLCFET at the latching condition along with its practical application.

From: Gallium nitride multichannel devices with latch-induced sub-60-mV-per-decade subthreshold slopes for radiofrequency applications

Fig. 5

a, Methodology adopted for stress testing of latching condition. The device was stressed for 90 min in steps of 2 min and IDVGS at VDS = 0.1 V to monitor the device condition. b, The evolution of ID and IG as a function of stressing time at VDS = 12 V and VGS = −11.5 V. Inset: the mean value of ID and IG over each 2-min cycle. c, The monitored ID and gm as function of VGS at VDS = 0.1 V after each stress cycle in the latching condition. d, The ID, gm and \({g}_{{\rm{m}}}^{{\prime\prime} }\) of the SLCFETs are plotted when biased at VDS of 8 V (unlatched condition) and 12 V (latched condition). Current compliance for ID was set to 200 mA. The normalization in d was performed by dividing the measured ID by the active source width of the device, which was approximately 50% of entire width. This was to have a one-to-one comparison with similar fin-based devices in the literature, for example, ref. 43.

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