Fig. 1
Sharp-shaped tip electrochemical metallization (ECM) devices. a Schematic illustration of the sharp tip ECM cell. b Simulation of the electric field inside the SiO2 layer. c A visualization of the electric field as obtained through a real-time time-dependent density functional theory (RT-TDDFT) simulation of the system in CP2K51. d Scanning electron microscope (SEM) image showing the top view of the atomic scale ECM cell. The dashed area indicates the location of the sharp tip, which is beneath the center area with the darker contrast. Scale bar, 200 nm. e Atomic force microscope (AFM) measured surface topology. f Transmission electron microscope (TEM) image of the device cross-section. The tip radius is 10 nm, marked by the red dashed line. Scale bar, 10 nm
