Fig. 1: Device layout.
a Scanning electron microscopy (SEM) image obtained after dry etching definition for a pair of magnetic tunnel junctions (MTJs). The nanopillars have a nominal diameter of 300 nm and a nominal edge-to-edge (dee) distance of 100 nm. The image is obtained at a viewing angle of 40° with respect to the perpendicular direction. b Top view SEM image obtained after dry etching definition of a pair of individual top contacts (ITCs) establishing electric contact to a pair of MTJs with dee = 100 nm. The blue arrow indicates the pinning direction of the reference synthetic antiferromagnetic (SAF) structure. c Illustration of the experimental setup used for the characterization of MTJ nanopillars with independent top contacts.
