Fig. 1: Tunnel current through a localised state in a graphene-hBN tunnel transistor. | Communications Physics

Fig. 1: Tunnel current through a localised state in a graphene-hBN tunnel transistor.

From: A magnetically-induced Coulomb gap in graphene due to electron-electron interactions

Fig. 1

a Schematic band diagram of the device showing the energy level E1 of the localised state in the barrier. Here, Vg and Vb are the applied gate and bias voltages, μB and μT are the chemical potentials on the bottom and top graphene layers measured with respect to the Dirac point on each layer, b is the tunnel barrier thickness and ED is the energy difference between the Dirac points of each layer. b Measured steps in current-voltage, I(Vb), curves at Vg = 0 (red) and Vg = 1.65 V at a temperature T = 1.75 K and in zero magnetic field, B = 0, due to tunnelling through a single defect state. To compare the relative magnitude of the tunnelling current through one defect, the dashed black curve shows I(Vb) for a similar defect-free tunnel device. c I(Vb) curves at finite magnetic field, B = 3.75 T, T = 1.75 K and Vg = 0 (red) and Vg = 1.65 V (blue): the inset shows schematically the current flow when Vb = 0 and Vg > 0.

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