Fig. 1: Preparation and microscopic characterization of the nano-patterned MoS2 multilayer. | Communications Materials

Fig. 1: Preparation and microscopic characterization of the nano-patterned MoS2 multilayer.

From: Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors

Fig. 1

a A schematic illustration of nano-scale patterning process on multilayer MoS2. b ADF-STEM image showing an array of nanoholes in the multilayer MoS2. c FFT pattern representing a crystallographic hexagonal array of hexagon holes (from Supplementary Fig. 3a). d STEM-EDX elemental mapping (top panels) for Mo K, S K, and Si K peaks (scale bars of 50 nm) and cross-sectional view (bottom panel) of the multilayer nanoporous MoS2.

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