Fig. 2: Representative in situ SEM and CSnanoXRD data at LS2. | Communications Materials

Fig. 2: Representative in situ SEM and CSnanoXRD data at LS2.

From: Resolving the fundamentals of the J-integral concept by multi-method in situ nanoscale stress-strain mapping

Fig. 2

In situ SEM data (a, b) showing total normal εyy-strains and shear εyz-strains. The CSnanoXRD data (c–h) provides SAXS micrographs (c) used for quantitative crack growth evaluation, while average FWHM data (d) details qualitatively the microstructural evolution. Stress components σyy, σzz, and σyz are given in (e–g), while the σvon Mises distribution calculated from the respective stress components is shown in (h). All scale bars correspond to 5 µm.

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