Fig. 2: Optical micrographs illustrating variations in aluminium-doped zinc oxide (AZO) and CuI thin films based on dopant and annealing conditions.

Scanning electron microscopic images where (a–c) represent AZO nanorod arrays with Al dopant concentrations. a 2%, b 3%, and c 6%, respectively. d, e Shows CuI thin films with NaI concentrations. d 0.05 and e 0.075. f The image provides a low-magnification view of the 0.075 NaI CuI thin film. g Features the film with 0.1 NaI concentration. h, i Temperature annealing effects on the CuI thin films. h 150 °C and i 200 °C. j Transmission electron microscopy (TEM) brightfield image of 3% AZO. Corresponding high-resolution TEM (HRTEM) and selected area of diffraction (SAED) images are presented in (k) and (l). m TEM brightfield image of CuI. Corresponding HRTEM and SAED images are presented in (n) and (o).