Figure 4 | Scientific Reports

Figure 4

From: Maskless Plasmonic Lithography at 22 nm Resolution

Figure 4

AFM image of a PNL parallel writing result on the thermal resist.

Two of MPLs in an array were used to simultaneously write independent patterns, capital letters “PI” and “LI”, respectively. MPL1 used a fixed laser power at 2 times that used in generating the result in Fig. 3 and MPL2 used an increasing power varying from 2 to 4 times. As the laser power level further increases, the side lobe patterns from the MPL start to show on the resist layer.

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