Figure 1
From: Fabrication of Ultrafine Soft-Matter Arrays by Selective Contact Thermochemical Reaction
Schematic illustration of the patterning of soft-matter thin films using SCTR.
(a) Dip-coating of a precursor film on the plasma-treated PDMS stamp. (b) Placing the PDMS stamp on top of the second precursor thin film (spin-coated on the plasma-treated silicon wafer). (c) Developing the non-crosslinked part of the polymer thin film on the Si wafer to generate the final pattern. (d) Dip-coating of a precursor film on the plasma-treated wrinkled PDMS stamp. (e) Contacting two substrates for SCTR. (f) Developing the non-crosslinked part of the thin film for fabricating nanoarrays.
