Figure 1 | Scientific Reports

Figure 1

From: Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

Figure 1

Schematic fabrication procedure of MTJ nanopillars using NSL.

(a) Bottom mesa structures are created from the blanket MTJ film by the first photolithography and ion beam etching, then the bottom contacts are protected by the second photolithography. (b) Random nanospheres are deposited on the entire wafer. (c) MTJ nanopillars are defined by the second ion beam etching. (d) SiO2 insulating layer is deposited. (e) Nanospheres and photoresist are lifted off, exposing the contact window. (f) Complete samples with Ta/Au top electrodes.

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