Figure 2
From: Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography
Actual pictures during nanopillar fabrication.
(a) 400 nm nanosphere are deposited on the wafer with base mesa structure. (b) MTJ nanopillar after the second ion beam etching (nanosphere is purposely removed for this picture to show the pillar before the deposition of SiO2). (c) Contact window is created by lifting off the nanospheres after SiO2 deposition. (d) Image reversal pattern created by the third photolithography, before deposition of Ta/Au bilayer. (e) After deposition and lift off of Ta/Au bilayer. (f) Fully patterned MTJ nanopillars.
