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Figure 1

From: Real-time identification of the evolution of conducting nano-filaments in TiO2 thin film ReRAM

Figure 1

Crystallographic structure and switching properties of the two samples.

(a) GAXRD spectra of the TiO2 thin films deposited by PEALD (black, upper graph) and sputtering (red, lower graph). PEALD TiO2 film has an anatase (A) structure, whereas the sputtered TiO2 film has a rutile (R) structure. The black circles indicate the Pt substrate. (b) and (c) show the typical unipolar resistive switching curves observed in PEALD and sputter-deposited TiO2 films, respectively. Inset figures in (b) and (c) show the distribution of the switching parameters.

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