Figure 3
From: Large Electric Field–Enhanced–Hardness Effect in a SiO2 Film
Cantilever deflection versus nominal separation at different tip bias for a film with a thickness of 450 nm and comparison between the reduced elastic modulus calculated for two different film thicknesses.
(a) Cantilever deflection versus nominal separation obtained while loading a 450 nm thick SiO2 film for different values of the tip bias. Five loading curves are portrayed for every value of the applied electric field. (b) Reduced elastic modulus obtained for 450 and 550 nm thick SiO2 films.
