Figure 2

Comparison of electrical characteristics of proposed CF-based TCEs on n-GaN layers before and after EBD.
(a,b), I–V characteristic curves measured for different pad spacings of insulating ITO deposited on n-GaN layers (a) before and (b) after EBD. (c,d), I–V characteristic curves measured for different pad spacings of insulating ITO deposited on n-GaN layers (c) before and (d) after EBD.