Figure 4
From: Line-patterning of polyaniline coated MWCNT on stepped substrates using DC electric field
Line patterning of MWCNT@PANI on a stepped PDMS film.
(a) Line width of MWCNT@PANI line pattern versus step height of the PDMS film. (b) Schematic illustration of line patterning of MWCNT@PANI on a stepped PDMS substrate under DC electric fields. FEG-SEM images shown in the graph correspond to the fabricated line patterns (c to e). Red arrows indicate a sufficient cover of the high step on the PDMS substrate.
