Figure 2
XRD patterns of VO2-SiO2 composite films upon increasing the Si/V molar ratios in the deposition solution.
The annealing temperature and time were kept at 450°C and 1 hour, respectively.
Figure 2 | Scientific Reports
XRD patterns of VO2-SiO2 composite films upon increasing the Si/V molar ratios in the deposition solution.
The annealing temperature and time were kept at 450°C and 1 hour, respectively.
