Figure 1

Photoactive polymeric interfaces.

(a) Schematic representation of the photoactive interface used in this study. The photoactive layers are spin-casted thin films of P3HT, P3HT:PCBM or a photoresist. The substrate is a glass coverslip, in some cases covered with a conductive ITO layer. (b) Absorption spectra of the different active layer used in the study. At the wavelength used for excitation (435 nm for the photoresist, blue bar; 475 nm for P3HT and P3HT:PCBM, cyan bar) all samples absorb about 80–90% of the incident light. (c) Fluorescence imaging of HEK-293 cells cultured on a P3HT:PCBM substrate and stained with DAPI (blue) and PI (red). (d) MTT assay for cell proliferation up to 7 days in-vitro for different substrates.