Figure 7

(a) Temperature distribution in the Ge100/Si nanocomposite. (b) Temperature variations at the lines X* = 0.125, 0.250 and 0.500 (the solid symbols represent the results for Ge100/Si and the empty symbols indicate those for Ge110/Si). (c) The average temperature profiles along the Z direction in the samples Ge100/Si and Ge110/Si by applying the same heat flux. (d) Thermal resistances of TBP, nanoinclusion and channel regions for the samples Ge100/Si and Ge110/Si.