Figure 4
STM images.
Ultrathin carbon films deposited at relatively lower ion energy of 20-25 eV [(a–f)] and at low energy bi-level surface modification of 90 eV followed by 50 eV (90/50 eV) [(g–i)] using FCVA. (a), (b) and (c) are the STM images for the carbon film with a thickness of 1.2 nm (sample S-4). (d), (e) and (f) are the STM images for the carbon film with a thickness of 1.6 nm (sample S-5). (g), (h) and (i) are the STM images of the carbon film with a thickness of ~1.9 nm deposited using bi-level surface modification at 90/50 eV (sample S-6). (j), (k) and (l) are RMS histograms of the surfaces in (a), (c) and (f), respectively. All the STM images were recorded at similar conditions (It = 0.5–1 nA, Vg = 1 ~ 3 V).
