Figure 2

Temperature dependent resistivity as a function of film thickness and carrier density.
(a) Temperature dependent resistivity (ρ) as a function of thickness along with the variable range hopping (VRH) fit for a film of thickness 5 nm and numerical renormalization group (NRG) theory fit for a thickness of 200 nm. Inset shows the carrier density (ne) as a function of temperature (T). (b) Resistivity (ρ) as a function of temperature for 10, 50 and 100 nm films and numerical renormalization group (NRG) theory fit of the low temperature part. Inset shows the resistance (R) vs. temperature (T) characteristics of 200 and 50 nm samples at very low temperatures.