Figure 4

Variation of Ta channeling minimum yield and lattice spacing d(004) with film thickness.
(a) Tantalum channelling minimum yield (χ) with the depth varying from the interface to the surface as a function of thickness. (b) Lattice spacing (d) estimated from (004) XRD peak as a function of thickness. Inset shows the evolution of (004) XRD peak position with change in film thickness.