Figure 5
The relationship between the etch rate and the pulse energy distribution ratio.
The total fluence is fixed at 9.46 J/cm2, the pulse delay is 350 fs and the etch time is 90 min.
Figure 5 | Scientific Reports
The relationship between the etch rate and the pulse energy distribution ratio.
The total fluence is fixed at 9.46 J/cm2, the pulse delay is 350 fs and the etch time is 90 min.
