Figure 1
From: Large Scale Synthesis and Light Emitting Fibers of Tailor-Made Graphene Quantum Dots
(a) Schematic diagram showing the vapor-phase etching process on GO. First, GO monolayers were deposited on substrates by Langmuir-Blodgett technique, following which the substrates were suspended in a sealed vessel prefilled with the etching solution mixture. The vessel was then heated at 150 °C to allow the vapor-phase reaction to occur. AFM images of (b) pristine GO and GO sheets etched with a H2O2/DIW solution mixture for (c) 30 min. The corresponding height profiles are measured along the white lines. (d) AFM image of a GO sheet etched with a NH3/H2O2/DIW solution mixture for 30 min. All the scale bars in the insets represent 1 nm for height (I) and 100 nm for length (−). (e,f) TEM images of steam-activated GO sheets suspended on a lacey carbon grid at (e) low magnification and (f) high magnification.
