Figure 2
From: Self-aligned, full solution process polymer field-effect transistor on flexible substrates
Characterization of polymeric film.
(a) RMS roughness dependence on the reaction time for confined photo-catalytic oxidation method, UV/ozone and O2 plasma treatment on PET and (b) PMMA substrates. (c) Leakage current as a function of the applied electric field of PMMA insulator treated with CPO (10 mins), Plasma (10 mins) and UV/ozone (8 mins).
