Figure 1
From: A New Strategy of Lithography Based on Phase Separation of Polymer Blends
(a) Schematic of phase separation of PS and PEG polymer blends. (b) AFM image of spin-coated PS/PEG blend film. (c) Top SEM view and (d) tilted SEM view of PS nanopore structures after PEG removal. (e) Cross-sectional view of SEM image of PS nanopore structures with a height of 170 nm and a residual layer of ~30 nm and the inset of the schematic illustration of PEG droplet at the air/PS phase interface. The polymer blend concentration was 5 wt% with the ratio of PS:PEG = 2:3 (w/w) and the spin speed was set at 3000 r∙min−1.
