Figure 5
From: A New Strategy of Lithography Based on Phase Separation of Polymer Blends
(a) Schematic of fabricating wafer-scale surface-modified silicon nanostructures for AR by spin-coating phase separation lithography. (b) Photographs of 4″ AR silicon wafer (left) and bare silicon wafer (right). (c) Top view and (d) cross-sectional view of SEM images of surface-modified silicon nanostructures.
