Figure 6
From: A New Strategy of Lithography Based on Phase Separation of Polymer Blends
(a) Reflectance spectra of bare silicon wafer and AR wafer from 450 to 950 nm. The reflectance of AR wafer is under 3%. (b) Simulated optical reflection and absorption spectra of AR wafer with the incident angle of 0° and 30°, respectively and the inset shows the typical electric field distribution at the wavelength of 730 nm.
