Figure 2
Top panels: XPS spectra in the binding energy range of (a) Ni 2p, (b) O 1s and (c) C 1s emissions obtained from the SiOx/Si(100) substrate (dotted curves) and from Ni/NiOx films (thickness 30–50 nm) grown ontop by PSE-CVD from 2.5 mM precursor solution with various water concentrations (from 0.0% to 10.0 vol%) at a substrate temperature of 270 °C (solid lines). Bottom panels: Integral peak intensities determined from fits to the XPS data (see text for details).
