Table 5 Comparison of quaternary electrodeposition of CZTS thin-films.

From: Facile Growth of Cu2ZnSnS4 Thin-Film by One-Step Pulsed Hybrid Electrophoretic and Electroplating Deposition

Published

Method

Sulfurization

Efficiency

Ref.

year

temperature (°C)

(%)

2010

Electroplating

550 °C

N/A

25

2011

Electroplating

550 °C

N/A

26

2011

Electroplating

500 °C

N/A

27

2011

Electroplating

550 °C

N/A

28

2012

Electroplating

550 °C

1.21

29

2013

Electroplating

200-600 °C

N/A

30

2013

Electroplating

500 °C

N/A

31

2013

electrophoretic deposition

Not mentioned

N/A

7

2014

Electroplating

450–580 °C

N/A

32

2014

Electroplating

300–500 °C

N/A

33

2014

Electroplating

550 °C

N/A

34

2014

Electroplating

580 °C

1.66

35

2014

Electroplating

590 °C

5.53

36

2015

Hybrid electrodeposition

450–600 °C

0.59

This work