Figure 2 | Scientific Reports

Figure 2

From: Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute

Figure 2

AFM height images of different thicknesses of PS100-b-PMHxOHS25 after annealing at 130 °C for 1 min

(a–e) on PS-r-PMA, (f–j) on PMMA-r-PMA and (k–o) on poly hydroxyethyl methacrylate (PHEMA). The PS100-b-PMHxOHS25 thicknesses were (a,f,k) 32 nm (=2.0L0); (b,g,l) 28 nm (=1.8L0); (c,h,m) 24 nm (=1.5L0); (d,i,n) 20 nm (=1.3L0); and (e,j,o) 16 nm (=1.0L0). Fingerprint patterns were observed for (f,i). No image was observed for the others.

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