Figure 4
From: Time Invariant Surface Roughness Evolution during Atmospheric Pressure Thin Film Depositions
(a) The initial substrate used in simulation. The substrate began with ω = 0.68 lattice units and α = 0.24. This particular example used the parameter hl = 8 lattice units. (b) The simulated film after 1,000 time steps. The morphology shown is the statistically invariant morphology observed after ωc has been reached. (c) The simulated film after 1,500 time steps.
