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Figure 1

From: Thickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistors

Figure 1

(a–e) Schematic diagrams, (f–j) plan-view SEM images, and (k–o) cross sectional TEM images of the samples characterized in this study. The film structures of the samples are (a,f,k) HfO2/SiO2, (b,g,l) HfO2/graphene/SiO2, (c,h,m) HfO2/NMP-treated graphene/SiO2, (d,i,n) HfO2/ZnO/graphene/SiO2, and (e,j,o) HfO2/Hf/graphene/SiO2. The insets of (k–o) are low magnification TEM images to show the global film morphology.

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