Figure 6

Residual stress distributions σ₂₂(y, z), σ₂₃(y, z) and σ₃₃(y, z) at the positions y, z in the as-deposited 9 μm thick TiN film.

The residual stress values demonstrate the presence of two film regions FUP and FLP with different microstructure as indicated by FWHM_δ(y, z) in Fig. 4.