Table 1 Magnetic performance and electrical resistivity of the FeAlO films compared with other granular films reported in the literature.
Fabrication method | Composition | Ms (T) | ρ (μΩ∙cm) | fr (GHz) | Δf (GHz) |
|---|---|---|---|---|---|
Pulsed laser deposition | FeAlO 473 K HT | 1.05 | 2750 | 1.1 | 3.5 |
FeAlO 573 K HT | 1.16 | 1200 | 1.1 and 2.5 | 3.0 | |
Reactive sputtering | FeAlO24 | 1.8 | 66 | 0.8 | – |
Reactive sputtering | CoAlO25 | 0.95 | 1000 | 2.45 | – |
Reactive sputtering | FeCoAlO26 | 1.6 | 400 | 2.3 | 1.0 |
Reactive sputtering | FeCoAlN27 | 1.08 | 275 | 1.72 | 1.5 |
Co-sputtering | CoZnO28 | 1.47 | 190 | 3.78 | 1.0 |
Reactive sputtering | FeCoSiN7 | 1.0 | 1000 | 1.1 | 0.4 |
Reactive sputtering | FeN29 | 1.26 | 190 | 1.1-2.2 | 1.7 |
