Table 1 Technical status of,and main obstructions to, permanent magnet preparation using thin film or powder3,4,8,9,10,12,22.
Nitride | Strain | Microstructure | Magnetic property | |
|---|---|---|---|---|
Thin film | Plasma nitriding during deposition | Strain by lattice mismatch between FeN layer and substrate (Giant Ms) | No action (Low coercivity) | soft magnetic property |
Powder | Nitriding in wide range temperatures (150 °C to 650 °C) | No strain (No giant Ms) | No action (Coercivity depends on its size) | Soft magnetic property on larger particles, hard magnetic property on small particle (<50 nm) |
