Figure 4: XPS spectra of O1s core level of CFO thin films.

(a) CFORT(Random) (as deposited), (b) CFORT(Random) (post-annealed at 800 °C), (c) CFO250(111) (as-deposited), (d) CFO250(111) (post-annealed at 400 °C), (e) CFO375(Random) (as deposited) and (f) CFO375(Random) (post-annealed at 400 °C). Schematic (x) shows the illustration of the fcc CFO lattice dimension of the as-deposited CFORT(Random) with oxygen vacancies and oxygen at interstitial sites. (y) is the schematic showing the effect of the post-annealing temperature on the CFORT(Random) film. Lattice wall of the bottom layer of CFO thin film is covalently bonded with the substrate and posses the fcc structure, however as the layer thickness increased it transformed from the fcc to the fct structure with the removal of oxygen from the interstitial sites.