Table 1 Seed layer and Bulk TNO layer deposition experimental details.
Deposition variables | ALD seed layers | Sputtered seed layers | Bulk TNO layers on seed layers |
|---|---|---|---|
Ti precursor | TiCl4, Ti[OCH(CH3)2]4 | — | — |
Oxidizer | H2O, H2O2 | — | — |
Dep. temp (oC) | 100, 300 | RT | RT, 550 |
Anneal temp (oC) | — | 550 | 200–550 |
Anneal time (hrs.) | — | 2 | 2–18 |
Oxygen flow rate ratio (%) | — | 0–50 | 0–30 |
Thickness (nm) | 5, 30 | 5, 30 | 140 |
Niobium content (at. %) | 0 | 5, 10 | 5, 10 |
