Figure 1 | Scientific Reports

Figure 1

From: Large-roll growth of 25-inch hexagonal BN monolayer film for self-release buffer layer of free-standing GaN wafer

Figure 1

(a,c) Schematics of the LPCVD system for the growth of large-size monolayer h-BN. Borazane is put in a quartz boat of the precursor zone and the Cu foil is curved in cylindrical shape in the reaction zone. (b) Photograph of cylindrical Cu foil inserted into the reaction chamber, a 2″-diameter quartz tube. SEM images of as-grown h-BN flakes on Cu foil with a growth time of (d) 10 min, (e) 20 min, and (f) 30 min at 1000 °C; and (g) 5 min, (h) 10 min, and (i) 15 min at 1050 °C.

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